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  1. A.Sawa, K.Nakanishi, and T.Hanada, "Preparation and Properties of Rf-Sputtered Amorphous Films in the System SiO2-ZrO2", Thin Solid Films, in press.
  2. ‚j.Amezawa, T.Tomiga, N.Yamamoto, T.Hanada and Y.Tomii, "Electrical Conduction Properties of LaP3O9 Glass and Glass-Ceramics"C J. Amer. Ceram. Soc., 88[11], 3211-3214 (2005).
  3. T.Tachibana, S.Uchida, N.Yamamoto and T.Hanada, "Preparation and Thermal Expansion of Novel Glasses in the System ZrO2-WO3-Al2O3", J. Ceram. Soc. Japan, 112[5], S1254-S1256 (2004).
  4. Y.Kijima and T.Hanada, "Effect of the Pressure of Sputtering Atmosphere on the Physical Properties of Amorphous Aluminum Oxide Films", J. Mater. Sci., 35, 2193-2199 (2000).
  5. S.Yoshida, T.Hanada, S.Tanabe, and N.Soga, "Blue Photoluminescence from Si Doped Amorphous Silica Films by Rf-sputtering", Jpn. J. Appl. Phys., 35, Pt.1, 5A 2694-2697 (1996).
  6. T.Hanada, A.Ando, S.Tanabe, and N.Soga, "Properties and Network Constitution of Rf-Sputtered Amorphous Films in the System Silicon Dioxide-Aluminum Orthophosphate", J. Am. Ceram. Soc., 75[12], 3417-3420 (1992).
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